Molecular Beam Epitaxy (MBE) of III-V heterostructures

MBE Riber Compact 21

Contacts: Martina Morassi , Laurent Travers , Jean-Christophe Harmand and Aristide Lemaître

The C21 MBE system is optimized for the fabrication of III-V superlattices and heterostructures, with an ultimate precision (1-2%) over deposited thickness and alloy compositions. The most developed know-how associated to this MBE machine, concerns the fabrication of distributed Bragg reflectors based on the AlAs/GaAs system, containing various active structures, such as NIR quantum wells and quantum dots. Recently, the C21 activity is also focusing on InSb and AlInSb 2D epitaxy on GaAs. 

The chamber allows to grow on 2" wafers with a very good uniformity. It is equiped with:

• Nine effusion cells for Ga, Al, In, Bi, Be, Si
• Three cracker cells for P, As and Sb
• One BandiT and two optical pyrometers for temperature monitoring
• One interfaced reflective high-energy electron diffraction (RHEED) apparatus for real-time growth monitoring and user-friendly molecular flux calibration