Contacts : Davide Cammilleri and Thomas Maroutian
Growth of epitaxial oxide thin films:
Pulsed Laser Deposition is a versatile technique to grow epitaxial thin films and multilayers of complex materials such as functional oxides. Our research tool allows to transfer matter from ceramic target to single crystalline substrate with a pulsed excimer laser (248 nm wavelength). Typical conditions are 600 - 700 °C sample temperature and 10-3 - 10-1 mbar O2 or N2O chamber pressure.
The equipment can deposit oxide materials on various substrates like SrTiO3, Scandates (DyScO3), Sapphire and Silicon.
Oxide materials routinely available in the PLD machine are :
Figure 1: Pulsed Laser Deposition equipment
Figure 2: Pulsed Laser Deposition technic
Publications :
Tuning ultrafast photoinduced strain in ferroelectric-based devices
S.Matzen et al., Advanced Electronic Materials 5, 1800709 (2019)
DOI : https://doi.org/10.1002/aelm.201800709
C2N : https://www.c2n.universite-paris-saclay.fr/en/science-society/news/actu/112
Hight-quality crystalline yttria-stabilized-zirconia thin layer for photonic applications
G.Marcaud et al., Physical Review Materials 2, 035202 (2018)
DOI : https://doi.org/10.1103/PhysRevMaterials.2.035202
C2N : https://www.c2n.universite-paris-saclay.fr/en/science-society/news/actu/99
Low noise all-oxide magnetic tunnel junctions based on a La0.7Sr0.3MnO3/Nb:SrTiO3 interface
G.Kurii et al., Applied Physics Letters 110, 082405 (2017)
DOI : https://doi.org/10.1063/1.4977173
HAL : https://hal-cea.archives-ouvertes.fr/cea-01503092
Fundings :
